E-beam evaporation is a physical vapor deposition (PVD) technique where electron beam is generated from a tungsten filament and driven by electric and magnetic fields toward source material and transforms it into the gaseous phase to be deposited on the substrate surface.  This process occurs in high vacuum environment to form a thin film on substrate surface by the free path. E-beam evaporation has more advantages than thermal evaporation. It is able to melt material at very high temperature even tungsten, graphite,...; easy to control evaporation rate with combining quartz crystal sensor for feedback signal for adjust e-beam current and evaporate more materials without breaking vacuum. Thus, electron beam evaporation is used in the field of thin film processes, including semiconductors, optics, solar panels, glasses and architectural glass, so that they have the required conductive, reflective, transmission and electronic properties.