SYSKEY's electron beam deposition is a practical and highly reliable system. Our system can use a single large crucible for mass production, or multiple crucibles to achieve a multilayer film structure. We support semiconductor research and large equipment design. Planetary rotation design for single and multi-substrate can control the evaporation rate, the film thickness and uniformity is less than +/- 3%.

For the greatest process flexibility, an ion source can be integrated for Ion assisted deposition or pre-clean.