Products

Product ID:A100016

Display Equipment

PECVD
 
Features
Generation : G2~G3.5 LCD Generation
a-Si films, silicon oxide films and nitride films using SiH 4 and TEOS
High Deposition Rate ≥ 250nm/min
Excellent film quality uniformity
Excellent Reproducibility
Applications
FPD (a-Si / SiN / SiO)
Passivation (SiN /SiO)
 
 
PVD
 
Features

Generation : G2~G3.5 LCD Generation

Wide range of deposition process support supported by abundant experience and data

Excellent film quality uniformity

Excellent Reproducibility

Applications

FPD (TFT / OLED / smartphone)

Color filter