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Products 〉Low pressure CVD/Furnace System




Product ID:A100009
Low pressure CVD/Furnace System
- Substrate Size: up to 10 inch
- Vacuum 10-7 torr range base pressure
- Thickness uniformity : ±5%
- Substrate temperature up to 1700 °C
- Full auto control with touch screen display
Options
Chamber material : Quartz、Al2O3、Graphite
Furnace type: Horizontal, Vertical
Maximum Temperature : 1100℃、1300 ℃、1500 ℃、 1700 ℃
OES or RGA systems.
Load-Lock System(single substrate, cassette-to-cassette)
Cluster able for vacuum transfer of substrates
Applications
LPCVD
Annealing
Diffusion
Oxidation