Products

Products 〉Low pressure CVD/Furnace System
Product ID：A100009

Low pressure CVD/Furnace System

  • Substrate Size: up to 10 inch
  • Vacuum 10-7 torr range base pressure
  • Thickness uniformity : ±5%
  • Substrate temperature up to 1700 °C
  • Full auto control with touch screen display
Options
 
Chamber material : Quartz、Al2O3、Graphite
Furnace type: Horizontal, Vertical
Maximum Temperature : 1100℃、1300 ℃、1500 ℃、 1700 ℃                                   
OES or RGA  systems.
Load-Lock System(single substrate, cassette-to-cassette)
Cluster able for vacuum transfer of substrates
 
Applications
 
LPCVD
Annealing 
Diffusion
Oxidation