Products

Product ID:A100007

PECVD

  • Substrate Size: up to 12 inch
  • Vacuum 10-7 torr range base pressure
  • Thickness uniformity : ±3%
  • Up to 10 gas lines
  • Substrate Temperature ~ 400 ℃
  • Highly uniform gas distribution
  • Full auto control with touch screen display
Options
 
High vacuum pumping system
Load-Lock System(single substrate, cassette-to-cassette)
Cluster able for vacuum transfer of substrates

 

Applications
 
Plasma Cleaning
Growth of CNT and Graphene
SiOx, SiNx, a-Si, DLC and other Films